Garry Bordonaro

Garry J. Bordonaro serves as a Senior Photolithographic Process Engineer at the Cornell NanoScale Science and Technology Facility (CNF), where he has been an integral member of the technical staff since 1993. With nearly three decades of expertise, he specializes in both traditional and advanced lithographic processes, including DNQ-Novolak resist applications in contact and projection photolithography, as well as deep ultraviolet (DUV) processing on the facility’s ASML PAS 5500/300C stepper system.

Mr. Bordonaro’s comprehensive technical portfolio encompasses computer-aided design (CAD), precision photomask fabrication, and advanced process simulation utilizing KLA-Tencor’s PROLITH software suite. His broad knowledge base in general semiconductor processing techniques has made him a valuable resource for internal research teams and external facility users. Beyond his professional achievements in nanotechnology, Mr. Bordonaro maintains a parallel career as an accomplished musician, performing internationally with metal rock bands.