This course examines the fundamentals of photolithography in semiconductor manufacturing, focusing on technological developments that have enabled modern microelectronics. You will begin by analyzing early communication technologies and their limitations then progress through the key elements of photolithography processes, including wafer preparation, photoresist coating techniques, and automated stepper systems implementation.

Through demonstrations and analysis of industry-standard PROLITH software, you will learn to interpret simulation outputs and understand process optimization techniques used in manufacturing. Course content combines theoretical principles with practical applications, addressing actual challenges faced in semiconductor fabrication.

Exclusive access to Cornell's NanoScale Facility cleanroom, including virtual tours and demonstrations, will provide you with an inside look at photolithography tools and processes, from basic contact printing to current EUV systems, while teaching essential process control and optimization techniques used in high-volume manufacturing.

 

How It Works

Course Length
2 weeks

Effort
8 to 10 hours of study per week

Format
100% online, instructor-led
  • Mechanical, chemical, electrical, and materials engineers moving into semiconductor roles from adjacent manufacturing sectors
  • Process engineers and technicians seeking to deepen their theoretical understanding of daily fabrication tasks
  • Individuals interested in transitioning into semiconductor manufacturing or nanofabrication roles
  • Hardware and IC designers needing to understand design for manufacturing (DFM) and process limitations
  • Equipment and materials sales professionals who need to speak the technical language of their customers
  • Fabrication managers and team leads responsible for process control, yield optimization, and cleanroom operations
  • Researchers and graduate students preparing to work in nanofabrication facilities
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